Lam Research

Lam’s Digital Twin offerings scale from process to tool and up to virtual fabs

These simulation tools have been used in process window studies to select backside contact schemes with the widest process window

These etch profiles are compared to a target output profile and given a distance which is then minimized with further tests in the digital twin.

In contact engineering, MLFF is used to generate the contact interface between crystalline silicon and amorphous silicides

Lam also builds their deposition and etch tools as a digital twin

building virtual chambers with plasma flow simulation to help in recipe prediction while also optimizing chamber design for uniformity across the wafer

Lam Research presented work on their Coventor SEMulator3D software